JPS6332273B2 - - Google Patents
Info
- Publication number
- JPS6332273B2 JPS6332273B2 JP58082932A JP8293283A JPS6332273B2 JP S6332273 B2 JPS6332273 B2 JP S6332273B2 JP 58082932 A JP58082932 A JP 58082932A JP 8293283 A JP8293283 A JP 8293283A JP S6332273 B2 JPS6332273 B2 JP S6332273B2
- Authority
- JP
- Japan
- Prior art keywords
- source
- semiconductor
- region
- layer
- depth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58082932A JPS59207669A (ja) | 1983-05-10 | 1983-05-10 | 電界効果トランジスタの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58082932A JPS59207669A (ja) | 1983-05-10 | 1983-05-10 | 電界効果トランジスタの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59207669A JPS59207669A (ja) | 1984-11-24 |
JPS6332273B2 true JPS6332273B2 (en]) | 1988-06-29 |
Family
ID=13788000
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58082932A Granted JPS59207669A (ja) | 1983-05-10 | 1983-05-10 | 電界効果トランジスタの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59207669A (en]) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62296566A (ja) * | 1986-06-17 | 1987-12-23 | Matsushita Electronics Corp | 電界効果トランジスタおよびその製造方法 |
JPH081910B2 (ja) * | 1987-05-13 | 1996-01-10 | 日本電気株式会社 | 電界効果型半導体装置及びその製造方法 |
JPH081911B2 (ja) * | 1987-06-24 | 1996-01-10 | 日本電気株式会社 | 電界効果型半導体装置及びその製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5768077A (en) * | 1980-10-15 | 1982-04-26 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of schottky gate type field effect transistor |
-
1983
- 1983-05-10 JP JP58082932A patent/JPS59207669A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59207669A (ja) | 1984-11-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR970004457B1 (ko) | 반도체 장치 및 그 제조 방법 | |
US3823352A (en) | Field effect transistor structures and methods | |
US4351099A (en) | Method of making FET utilizing shadow masking and diffusion from a doped oxide | |
JPH0260063B2 (en]) | ||
US5877047A (en) | Lateral gate, vertical drift region transistor | |
JPH01175265A (ja) | 電界効果トランジスタ及びその製造方法 | |
JP3040786B2 (ja) | チャンネル限定層を使用するGaAs FETの製造方法 | |
JPS6332273B2 (en]) | ||
US4923824A (en) | Simplified method of fabricating lightly doped drain insulated gate field effect transistors | |
JPH04225533A (ja) | 電界効果トランジスタ | |
JPS6122873B2 (en]) | ||
JPH0213927B2 (en]) | ||
JPS59222966A (ja) | 半導体装置 | |
JP2921930B2 (ja) | 電界効果トランジスタ、その製造方法およびこれを用いた半導体集積回路 | |
JPS62115781A (ja) | 電界効果トランジスタ | |
JPH0523497B2 (en]) | ||
JP2996267B2 (ja) | 絶縁ゲート型電界効果トランジスタの製造方法 | |
JPS6223175A (ja) | 半導体装置の製造方法 | |
JP3018885B2 (ja) | 半導体装置の製造方法 | |
JPS6146990B2 (en]) | ||
JP2616032B2 (ja) | 電界効果トランジスタの製造方法 | |
KR910004319B1 (ko) | 고전자 이동 트랜지스터의 제조방법 | |
KR930009811B1 (ko) | 금속-반도체 전계효과 트랜지스터 및 그 제조방법 | |
JP3038720B2 (ja) | 電界効果トランジスタの製造方法 | |
JPH0121570Y2 (en]) |